PICS - a FP7 Project

A research project for small and medium enterprises focusing on the development of innovative ALD materials and tools for high density 3D
integrated capacitors.

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Atomic Layer Deposition (ALD)

Atomic layer deposition (ALD) is a thin film deposition technique that is based on the sequential use of a gas phase chemical process. The majority of ALD reactions use two chemicals, typically called precursors. These precursors react with a surface one at a time in a sequential, self-limiting, manner. By exposing the precursors to the growth surface repeatedly, a thin film is deposited.

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